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Products
SOKUDO DUO
RF3S
RF3
SK-60B/80B
RS-C810A/810L
Coat/Develop Track SOKUDO DUO
SOKUDO DUO is an innovative photolithography coater/developer that incorporates the world’s first dual track system.
Coat/Develop Track SOKUDO DUO

Coat/Develop Track RF3S
The RF3S is a higher throughput, upgraded version of the highly regarded, highly reliable RF3 platform with additional features not available on the original RF3.
Coat/Develop Track RF3S

Coat/Develop Track RF3
The SOKUDO RF3 is the 300 mm/200 mm substrate, high-end production platform.
In the field since 2003, the RF3 system is a proven workhorse for volume semiconductor manufacturing. Reliable, Fast, Fine, and Flexible are the key customer values of this platform.
Coat/Develop Track RF3

Coat/Develop Track SK-60B/80B
This coat/develop system is specifically designed for ease-of-use and low cost performance for a wide-range of semiconductor substrate processing. This mature technology platform ensures consistently high yields and robust manufacturing performance.
Coat/Develop Track SK-60B/80B


The RS-C810A/810L resist spray coater employs a spray system incorporated within the coating process to coat the surface of the wafer with both positive and negative resist.
Resist Spray Coater RS-C810A/810L
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