SOKUDO DUO is an innovative photolithography coater/developer that incorporates the world’s first dual track system. The RF3S is a higher throughput, upgraded version of the highly regarded, highly reliable RF3 platform with additional features not available on the original RF3. The SOKUDO RF3 is the 300 mm/200 mm substrate, high-end production platform. In the field since 2003, the RF3 system is a proven workhorse for volume semiconductor manufacturing. Reliable, Fast, Fine, and Flexible are the key customer values of this platform. This coat/develop system is specifically designed for ease-of-use and low cost performance for a wide-range of semiconductor substrate processing. This mature technology platform ensures consistently high yields and robust manufacturing performance. The RS-C810A/810L resist spray coater employs a spray system incorporated within the coating process to coat the surface of the wafer with both positive and negative resist.