All images shown on the Press Releases can also be downloaded from the
following
site.
Nov. 29, 2010
SOKUDO DUO sets productivity world record and >350wph throughput target
Sep. 16, 2010
SOKUDO Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Process
Jun. 23, 2009
Notice: SOKUDO Co., Ltd., Share Acquisition & Subsidiary Transition (PDF:120KB)
May 07, 2009
SOKUDO DUO track system achieved 300wph throughput
Apr. 21, 2009
SOKUDO DUO System Introduces the World’s First Dual Track Platform, Enabling up to 300wph Throughput
Mar. 31, 2009
Change in the Representative Director, President & CEO Position
Feb. 27, 2008
Nova and SOKUDO Integrate NovaScan CD Metrology on RF
3
Photolithography Track Systems
Feb. 22, 2008
Spansion Selects SOKUDO’s RF
3S
System for 32 nm Immersion Lithography Processing
Dec. 03, 2007
SOKUDO Introduces 200wph RF
3T
Coat/Develop System
Jul. 10, 2007
Sokudo Introduces Major Technology Advancements in New RF
3S
Track System for Immersion and Dry Lithography
Sep. 20, 2006
JSR Micro, Inc. Selects RF
3
Track System from Sokudo Co., Ltd.
Jul. 20, 2006
Applied Materials and Dainippon Screen Sign Final Agreement to Form Sokudo Joint Venture Company
Jul. 3, 2006
Profile of SOKUDO Co., Ltd. (Released May 15, 2006)
Dainippon Screen Mfg Co., Ltd.
Applied Materials, Inc.
Jul. 3, 2006
SOKUDO website launch
SOKUDO welcomes you to our brand new Website (www.sokudospeed.com).
