Immersion ArF multi-patterning, EUV, Multi-E-beam, nanoimprint, Directed Self-Assembly (DSA), and even back-end lithography applications would all (or only the cost effective winners) need to make transition from 300mm to 450mm wafer size. Nanoimprint established the first 450mm patterned wafers early 2013. Will we continue 450mm patterning in darkness? Are there alternatives? When will the dawn of lithography light come for 450mm wafer patterning?
World's first full 450mm optical lithography exposed wafer presented by Charles Pieczulewski, SOKUDO, and Doug Shelton, CANON.
The SOKUDO Lithography Breakfast Forum 2013 is hosted by SOKUDO Co., Ltd., in cooperation with SEMI