18th Annual SOKUDO Lithography Breakfast Forum

SOKUDO Lithography Breakfast Forum 2011
Theme: I Need More "E" Power, Scotty!

Date:	Wednesday, July 13, 2011
Time:	07:30 Breakfast, 08:00-10:00 Presentations
Location:	San Francisco Marriott Marquis, Mission & 4th Street, San Francisco, CA
18^th Annual SOKUDO Lithography Breakfast Forum Theme: Technical progress is being made in next generation lithography for 2xnm node by alternative exposure technologies such as Extreme UltraViolet (EUV) and E-Beam Mask-Less Lithography (ML2). However, immersion ArF (optical) lithography extensions remain as primary driver for the near-future. Both EUV and ML2 confront one common challenge: Insufficient “EUV, Electron, Exposure” power on wafer. Hence the theme: I Need More “E” Power, Scotty!

Program:
	GLOBALFOUNDRIES (Yayi Wei, Senior Member of Technical Staff, AMTD Lithography) View Presentation (PDF7: 0.2MB)

	NIKON (Steve Renwick, Sr. Principle Eng., NPI) on Optical Extensions View Presentation (PDF7: 2.3MB)

	MAPPER LITHOGRAPHY (Bert Jan Kampherbeek, VP Business Development) on E-Beam View Presentation (PDF7: 0.6MB)

	ASML (Skip Miller, Director, Strategic Marketing) on EUV Lithography View Presentation (PDF7: 4.7MB)

	XTREME Technologies (Marc Corthout, President) on EUV Source View Presentation (PDF7: 1.8MB)

	SEMATECH (Stefan Wurm, Assoc. Director of Lithography) on Lithography Collaborations View Presentation (PDF7: 2.2MB)

Hosted by SOKUDO Co., Ltd. in collaboration with SEMI

Annual SOKUDO Lithography Breakfast Forum History…
2010 2009 2008 2007 2006 2005 2004 2003

Mark your calendars now for the...
19th Annual Sokudo Lithography Breakfast Forum
Wednesday, July 11, 2012
at the San Francisco Marriott Marquis