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SOKUDO Lithography Breakfast Forum
"Double Patterning Jumps the 200wph Hurdle"

Date:      Wednesday, July 15, 2009
Location: San Francisco Marriott, Yerba Buena, Salon 9
              Mission & 4th Street, San Francisco, California

Presentation Files
GLOBALFOUNDARIES, Tom Wallow View Presentation (PDF:3.1MB)
Nikon, Stephen Renwick View Presentation (PDF:63KB)
ASML, Skip Miller View Presentation (PDF:4.1MB)
Sokudo, Charles Pieczulewski View Presentation (PDF:1.6MB)
Gartner, Bob Johnson View Presentation (PDF:219KB)

Immersion lithography Double Patterning variations are many but the common challenge is having a cost-effective solution. The photolithography infrastructure prepares to bring double patterning to volume production at high throughput to achieve industry CoO goals.

See also on-line SEMICONDUCTOR INTERNATIONAL article 2009 July 16 "Toolmakers Ease Double Patterning Throughput Hit" by Aaron Hand:
http://www.semiconductor.net/article/315511-Toolmakers_Ease_Double_Patterning_Throughput_Hit.php

Annual Lithography Breakfast Forum
Presentations from Previous Forums
2008    2007    2006    2005    2004    2003

Mark your calendars now for the...
17th Annual Sokudo Lithography Breakfast Forum
Wednesday, July 14th, 2010 at the San Francisco Marriott

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