16th Annual SOKUDO Lithography Breakfast Forum

SOKUDO Lithography Breakfast Forum
"Double Patterning Jumps the 200wph Hurdle"

Date: Wednesday, July 15, 2009
Location: San Francisco Marriott, Yerba Buena, Salon 9
Mission & 4th Street, San Francisco, California

Presentation Files

GLOBALFOUNDARIES, Tom Wallow	View Presentation (PDF:3.1MB)
Nikon, Stephen Renwick	View Presentation (PDF:63KB)
ASML, Skip Miller	View Presentation (PDF:4.1MB)
Sokudo, Charles Pieczulewski	View Presentation (PDF:1.6MB)
Gartner, Bob Johnson	View Presentation (PDF:219KB)

Immersion lithography Double Patterning variations are many but the common challenge is having a cost-effective solution. The photolithography infrastructure prepares to bring double patterning to volume production at high throughput to achieve industry CoO goals.

See also on-line SEMICONDUCTOR INTERNATIONAL article 2009 July 16 "Toolmakers Ease Double Patterning Throughput Hit" by Aaron Hand:
http://www.semiconductor.net/article/315511-Toolmakers_Ease_Double_Patterning_Throughput_Hit.php

Annual Lithography Breakfast Forum
Presentations from Previous Forums
2008 2007 2006 2005 2004 2003

Mark your calendars now for the...
17th Annual Sokudo Lithography Breakfast Forum
Wednesday, July 14th, 2010 at the San Francisco Marriott