SOKUDO Lithography Breakfast Forum
"Double Patterning Jumps the 200wph Hurdle"
Date: Wednesday, July 15, 2009
Location: San Francisco Marriott, Yerba Buena, Salon 9
Mission & 4th Street, San Francisco, California
Immersion lithography Double Patterning variations are many but the common challenge is having a cost-effective solution. The photolithography infrastructure prepares to bring double patterning to volume production at high throughput to achieve industry CoO goals.