3rd International Symposium on Immersion Lithography Location: Kyoto, Japan Venue: ANA Hotel Kyoto Period: Oct. 2-5, 2006 SOKUDO Technical Papers at the 3rd International Symposium on Immersion Lithography Poster Session Wednesday, October 4th DP-24 “Long-term Immersion Defect Monitoring on Production Exposure Scanner and Coat/Develop Track In-Line Lithocell”, Kazuhito Shigemori*, Masashi Kanaoka, Masami Asai, Coen Verspaget (SOKUDO), Richard Moerman, Cedric Grouwstra (ASML) DP-25 “Watermark and Satellite Defect Reduction Process Optimization on Coat / Develop Track System”, Masakazu Sanada*, Kazuhito Shigemori, Tadashi Miyagi, Masami Asai, Shuichi Yasuda, Masashi Kanaoka, Shinpei Hori (SOKUDO) SEMATECH WEB SITE http://www.sematech.org/meetings/announcements/7799/