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Coat/Develop Track SOKUDO DUO
SOKUDO DUO is an innovative photolithography coater/developer that incorporates the world’s first dual track system. Featuring dual-flow wafer processing, the SOKUDO DUO dramatically boosts throughput to 350-450 wafers per hour (wph), depending on system configuration, while substantially reducing system footprint.


High-throughput while ensuring high-reliability
Running dual, parallel process lines dramatically improves wafer throughput. Since the load is distributed between two separate lines, the SOKUDO DUO also contributes to higher wafer handling robotics reliability since it enables reduced wafer transfer speeds without compromising wafer throughput.

Non-stop operation delivers high availability
The dual-flow concept makes it possible to run each wafer process line independently. Maintenance can be performed while the system is running production, greatly reducing system downtime. The overall lithography cell wafer output, productivity is optimized by keeping the coat/develop process running so that expensive photolithography exposure scanner time is not wasted.

Small footprint & flexible configuration
The dual process line system is a compact platform design that significantly reduces footprint. Various system configurations can be tailored to match specific coat/develop applications to deliver optimized wafer output for the available clean-room area.

Novel Immersion Lithography & Yield-Improving Wafer Cleaning Solutions
With SOKUDO’s over 30-year technical know-how, the system supports advanced immersion ArF lithography, EUV, E-Beam and Directed Self-Assembly (DSA) coat / develop / bake track solutions to realize high yield for volume production.

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